Buyer guide
Semiconductor cleanrooms: vibration criteria and airborne molecular contamination
A semiconductor cleanroom needs two limits besides particles: floor vibration and airborne molecular contamination (AMC). Vibration is set by VC curves from VC-A at 2,000 µin/s to VC-E at 125 µin/s, and AMC is graded under ISO 14644-8:2022, which covers concentrations from 10⁰ g/m³ (1 g/m³) down to 10⁻¹² g/m³.
By ZY Cleanroom · Updated · Sources at the end of the page
Vibration criteria
The criteria are RMS velocity limits in one-third octave bands from 8 to 100 Hz (Newport). The µm/s column is calculated at 1 µin = 0.0254 µm, so VC-D at 250 µin/s is 6.35 µm/s.
| Criterion | µin/s | µm/s (calculated) | Detail size, µm | Typical use (Newport) |
|---|---|---|---|---|
| VC-A | 2,000 | 50.8 | 8 | Optical microscopes to 400X, microbalances, aligners |
| VC-B | 1,000 | 25.4 | 3 | Microscopes to 1000X; steppers to 3 µm line widths |
| VC-C | 500 | 12.7 | 1 | Most lithography and inspection to 1 µm detail |
| VC-D | 250 | 6.35 | 0.3 | Electron microscopes and E-beam systems |
| VC-E | 125 | 3.175 | 0.1 | Long-path laser systems; hard to reach |
How to use the curves
Below VC-A, Newport lists the ISO building criteria: workshop 32,000 µin/s, office 16,000, residential day 8,000 and operating theatre 4,000. VC-A is half the operating theatre limit. VC-E is one thirty-second of it. The step from VC-A to VC-E is 2,000 ÷ 125, or 16 times tighter (calculated).
Newport says much fab design work sets goals of VC-D to VC-E, which it believes suits 0.3 µm line widths. It says lines of 0.18 µm and below will almost certainly need active isolation. The page is undated, so check these statements against your own tool maker.
Newport also says the curves are guidance and do not replace narrowband analysis for diagnostic studies. Ask each tool maker for its own floor limit and write the strictest one into the brief.
VC is a floor criterion, not a room class. Write it into the brief as its own line, next to the particle class.
AMC categories
An article by Robert Donovan, a process engineer assigned to Sandia National Laboratories, describes the four SEMI F21-95 categories. The class number is the cap in parts per trillion on a molar basis, so MA-10 allows 10 ppt of acids. That is the 1995 edition. SEMI has since issued F21-1016, so check the current edition before writing a spec.
Donovan lists the harm AMC can do: suppressed oxide growth, degraded oxide quality, corroded metal layers, chemical doping, altered electrical properties at interfaces and degraded photoresist. It also corrodes cleanroom tools and structures. For dopants he says the best control is to remove the source, and that any detectable level is probably too much.
| Category | Example given | Control |
|---|---|---|
| Acids (MA) | None named in the article | Impregnated activated carbon, or ion-exchange fibre carrying a cationic species |
| Bases (MB) | Amines, which degrade photoresist | Impregnated activated carbon, or ion-exchange fibre carrying an anionic species |
| Condensables (MC) | High-boiling organics | Activated carbon |
| Dopants (MD) | Boric acid, organophosphates, arsenates; unwanted doping | Remove the source |
Where the filters go
Donovan lists activated carbon, permanganate-treated carbon for sulphur oxides, ion-exchange fibres and fraipontite. Chemical filters often sit upstream of HEPA filters because they can shed particles.
The ISO page says the standard sets assessment processes to grade air chemical cleanliness by the airborne concentration of specific substances. It includes a protocol for test methods, analysis and time-weighted factors. It does not describe the nature of the contaminants.
Put four lines in the brief: the particle class, the VC limit, the AMC categories to control with a target level for each, and who will measure them. That list is a suggestion, not a standard.
ISO 14644-8:2022 is the third edition, titled Assessment of air cleanliness by chemical concentration (ACC). It does not classify surface chemical contamination.
If you have a room list for a semiconductor project, send it to ZY Cleanroom and we will review the panel, door and ceiling scope with you.
Questions
Common questions
Which VC curve suits a 0.3 µm process?
Newport says much fab design work sets goals of VC-D to VC-E for 0.3 µm line widths. Your tool maker's limit decides.
Does the ISO 14644-1 class cover AMC?
No. ISO 14644-8 is a separate standard that assesses air by chemical concentration.
Do chemical filters go before or after HEPA?
Donovan says they are often upstream of HEPA, since they can shed particles.
Is VC a cleanroom class?
No. It is a vibration spectrum in one-third octave bands, set per tool or area.
Related guides
- Writing a cleanroom URS: contents and testable wording
- Building a cleanroom inside an existing building
- Cleanroom cost per m²: published ranges by ISO class
- What a cleanroom costs to run: energy, filters and testing
- Turnkey cleanroom contractor
- Room list builder
Sources
- Newport, Environmental Vibration Criteria (undated web page; checked 1 November 2026)
- ISO 14644-8:2022, Cleanrooms and associated controlled environments, Part 8: Assessment of air cleanliness by chemical concentration (ACC) (edition 3, June 2022; checked 1 November 2026)
- Robert P. Donovan, AMCs: Properties and gaining control, Semiconductor Digest (undated web page; checked 1 November 2026)
- SEMI, F21: Classification of Airborne Molecular Contaminant Levels in Clean Environments (store listing, revision F21-1016; checked 1 November 2026)
Project enquiry
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